Tungsten silicide, 99.5% (metals basis), Thermo Scientific Chemicals

Description

Tungsten silicide is used in microelectronics as a contact material. It is also used as a shunt over polysilicon lines to increase their conductivity and increase signal speed. Further, it acts as a barrier layer between silicon and other metals. In addition to this, it is used in microelectro mechanical systems and for oxidation-resistant coatings. It is also employed as a replacement for earlier tungsten films.

This Thermo Scientific Chemicals brand product was originally part of the Alfa Aesar product portfolio. Some documentation and label information may refer to the legacy brand. The original Alfa Aesar product / item code or SKU reference has not changed as a part of the brand transition to Thermo Scientific Chemicals.

Specifications

• Melting Point: 2165°C
• Physical Form: Powder
• Quantity: 10 g
• Solubility Information: Insoluble in water.
• Formula Weight: 240.02
• Percent Purity: 99.5%
• Odor: Odorless
• Assay: (metals basis)
• Chemical Name or Material: Tungsten silicide

RUO – Research Use Only